Guests from across the industry and throughout the world attended the National Microelectronics Institute Gala Dinner and Awards Ceremony 2010. An increasingly popular event, it is an important date in the microelectronics calendar. This year's dinner took place November 4 at the Park Plaza Victoria, London, and it was a night to remember for NXP Manchester Power MOSFETs who scooped the award for Manufacturing Site of the Year.
The National Microelectronics Institute (NMI) is the premier trade association for the semiconductor industry in the UK and Ireland. Their prestigious annual awards ceremony brings together stakeholders from across the microelectronics industry, with the objective of building and supporting a strong micro and nano-electronics community.
The future of the industry
Traditionally, the awards honor excellence in design, manufacture, business and education. But this year, in addition, the panel wanted to recognize organizations who have managed to bounce back stronger from the recession either through development of new products, new processes, operational efficiencies, or a combination of all of these.
NXP Manchester ticked the boxes and impressed the judges through best in class performance in on-time delivery and mechanical yield. The site had a very strong case, noted for consistent manufacturing target achievements while maintaining a very steep ramp up. But the awards are not just about the present; they aim to recognize the future of microelectronics and awarded NXP for investment in new technology and capacity.
We are proud to announce the NMI Manufacturing Site of the Year 2010, NXP Manchester Power MOSFETs.
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